Product Description
Film Etchant
Insulating Film Etchant with Significantly Reduced Al Damage Pure Etch ZE series
Excellent insulation etching of Al and Al alloy films without corrosion
This series includes standard products for etching of deposited insulating films and for removal of natural oxide film generated by the oxidation of Si surfaces.
Keywords: wet etching, SiO2, SiN, TEOS, silicon dioxide film, silicon nitride film
Features
- Less chemical damage on Al and Al alloy film
- Forming excellent forward taper
- Forming via and pad process by wet etching
- Also used as a pretreatment for Pure Etch 160 (Al Damageless Si Etchant).
