Chemicals capable of stripping positive resist, negative resist, and dry film resist are available.
This series includes strippers containing a combination of amine and solvent, solvent-based strippers, strippers containing a combination of amine, solvent, and water, and organic alkali-based strippers.

Keywords: Resist Stripping, Residue Removal, Lift-Off, Non-Water-based, Water-based, Non-Hazardous, No NMPs, NMP-Free

Features

• Excellent resist removal without chemical damage on metal film and insulating film
• Usable from low temperature to high temperature
• Both NMP-free resist strippers